Award Abstract # 0514766
Emerging Reliability Issues of Nano-Scale SOI Technology

NSF Org: ECCS
Division of Electrical, Communications and Cyber Systems
Recipient: GEORGE MASON UNIVERSITY
Initial Amendment Date: August 19, 2005
Latest Amendment Date: August 19, 2005
Award Number: 0514766
Award Instrument: Standard Grant
Program Manager: Pradeep Fulay
pfulay@nsf.gov
 (703)292-2445
ECCS
 Division of Electrical, Communications and Cyber Systems
ENG
 Directorate for Engineering
Start Date: August 1, 2005
End Date: July 31, 2009 (Estimated)
Total Intended Award Amount: $240,000.00
Total Awarded Amount to Date: $240,000.00
Funds Obligated to Date: FY 2005 = $240,000.00
History of Investigator:
  • Dimitrios Ioannou (Principal Investigator)
    dioannou@gmu.edu
Recipient Sponsored Research Office: George Mason University
4400 UNIVERSITY DR
FAIRFAX
VA  US  22030-4422
(703)993-2295
Sponsor Congressional District: 11
Primary Place of Performance: George Mason University
4400 UNIVERSITY DR
FAIRFAX
VA  US  22030-4422
Primary Place of Performance
Congressional District:
11
Unique Entity Identifier (UEI): EADLFP7Z72E5
Parent UEI: H4NRWLFCDF43
NSF Program(s): EPMD-ElectrnPhoton&MagnDevices
Primary Program Source: app-0105 
Program Reference Code(s): 0000, OTHR
Program Element Code(s): 151700
Award Agency Code: 4900
Fund Agency Code: 4900
Assistance Listing Number(s): 47.041

ABSTRACT

The objective of this research is the investigation of the following reliability concerns of nano-scale Silicon on Insulator (SOI) chip technology and devices: Hot Carriers (HC), Negative Bias Temperature Instability (NBTI), and Electro-Static Discharge (ESD) protection. The approach will be first to address each of the above reliability concerns individually, and identify the underlying mechanisms in each case. Following this, their interdependence and interaction will be addressed on account of the fact that the responsible mechanisms are usually active simultaneously. The investigations will be primarily experimental, on samples supplied by leading semiconductor manufactures, but substantial numerical simulations will also be done as/when needed. Two Ph.D. students will work under this proposal, and the research group will remain focused and informed through student summer internships and frequent discussions with leading semiconductor industry collaborators.

The expected impact of this research derives from the realization that when SOI devices are shrunk at the nano-level, they operate at elevated temperatures and the underlying degradation mechanisms behave in complicated ways; and the expectation that SOI will play a major role in future silicon chip technology nodes. This research will help identify the best designs for optimal reliability and performance. The educational environment will be impacted and enhanced by having several undergraduates (including underrepresented groups) "join the team" and work on their senior design projects. Further, the group will mentor the teaching assistants for the microelectronics courses and provide support to set-up and update experiments, prepare manuals, and maintain the necessary simulation tools and design software.

PUBLICATIONS PRODUCED AS A RESULT OF THIS RESEARCH

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(Showing: 1 - 10 of 12)
Ioannou, DE "Scaling limits and reliability of SOICMOS technology (invited)" Second Conference on Microelectronics, Microsystems and Nanotechnology , v.10 , 2005 , p.1 View record at Web of Science
Ioannou D.P. and Ioannou D.E. "Some Issues of Hot Carrier Degradation and Negative Bias Temperature Instability of Advanced SOI CMOS Transistors" Solid State Electronics , v.51 , 2007 , p.268
Ioannou, DP; Ioannou, DE "Some issues of hot-carrier degradation and negative bias temperature instability of advanced SOICMOS transistors" SOLID-STATE ELECTRONICS , v.51 , 2007 , p.268 View record at Web of Science 10.1016/j.sse.2007.01.00
Ioannou, DP; Mishra, R; Ioannou, DE; Liu, ST; Hughes, HL "Worst case stress conditions for hot carrier induced degradation of p-channel SOI MOSFETs" SOLID-STATE ELECTRONICS , v.50 , 2006 , p.929 View record at Web of Science 10.1016/j.sse.2006.04.04
Kontos, DK; Gauthier, R; Ioannou, DE; Lee, T; Min, W; Chatty, K; Putnam, C; Muhammad, M "Interaction between electrostatic discharge and electromigration on copper interconnects for advanced CMOS technologies" 2005 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 43RD ANNUAL , 2005 , p.91 View record at Web of Science
Liu, ST; Ioannou, DE; Ioannou, DP; Flanery, M; Hughes, HL "NBTI in SOI p-channel MOS field effect transistors" 2005 IEEE International Integrated Reliability Workshop, Final Report , 2005 , p.17 View record at Web of Science
Mishra, R; Ioannou, DE; Mitra, S; Gauthier, R "Effect of floating-body and stress bias on NBTI and HCI on 65-nm SOI pMOSFETs" IEEE ELECTRON DEVICE LETTERS , v.29 , 2008 , p.262 View record at Web of Science 10.1109/LED.2007.91538
Richter, CA; Xiong, HD; Zhu, XX; Wang, WY; Stanford, VM; Li, QL; Ioannou, DE; Hong, WK; Lee, T "Measurements for the reliability and electrical characterization of semiconductor nanowires" 2008 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 46TH ANNUAL , 2008 , p.39 View record at Web of Science
Xiong, HD; Heh, D; Yang, S; Zhu, XX; Gurfinkel, M; Bersuker, G; Ioannou, DE; Richter, CA; Cheung, KP; Suehle, JS "Stress-induced defect generation in HfO2/SiO2 stacks observed by using charge pumping and low frequency noise measurements" 2008 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 46TH ANNUAL , 2008 , p.319 View record at Web of Science
Yang, Y; Salman, AA; Ioannou, DE; Beebe, SG "Design and optimization of the SOI Field Effect Diode (FED)" 2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2 , 2007 , p.421 View record at Web of Science
Yang, Y; Salman, AA; Ioannou, DE; Beebe, SG "Design and optimization of the SOI field effect diode (FED) for ESD protection" SOLID-STATE ELECTRONICS , v.52 , 2008 , p.1482 View record at Web of Science 10.1016/j.sse.2008.06.03
(Showing: 1 - 10 of 12)

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