Award Abstract # 8714476
Acquisition of Rutherford Backscattering Analysis System

NSF Org: DMR
Division Of Materials Research
Recipient: UNIVERSITY OF CALIFORNIA, LOS ANGELES
Initial Amendment Date: May 4, 1988
Latest Amendment Date: October 19, 1988
Award Number: 8714476
Award Instrument: Standard Grant
Program Manager: Yvette Jackson
DMR
 Division Of Materials Research
MPS
 Directorate for Mathematical and Physical Sciences
Start Date: May 15, 1988
End Date: April 30, 1990 (Estimated)
Total Intended Award Amount: $150,000.00
Total Awarded Amount to Date: $150,000.00
Funds Obligated to Date: FY 1988 = $20,000.00
FY 1989 = $130,000.00
History of Investigator:
  • Bruce Dunn (Principal Investigator)
    bdunn@ucla.edu
  • Kang Wang (Co-Principal Investigator)
Recipient Sponsored Research Office: University of California-Los Angeles
10889 WILSHIRE BLVD STE 700
LOS ANGELES
CA  US  90024-4200
(310)794-0102
Sponsor Congressional District: 36
Primary Place of Performance: DATA NOT AVAILABLE
Primary Place of Performance
Congressional District:
Unique Entity Identifier (UEI): RN64EPNH8JC6
Parent UEI:
NSF Program(s): MPS DMR INSTRUMENTATION
Primary Program Source:  
Program Reference Code(s):
Program Element Code(s): 175000
Award Agency Code: 4900
Fund Agency Code: 4900
Assistance Listing Number(s): 47.049

ABSTRACT

Rutherford Backscattering Spectrometry (RBS) in particular has evolved into major analytical technique for thin film and complements that available from existing instrumentation which emphasizes either bulk characterization or surface analysis. RBS offers good elemental specificity. The compositional information is quantitative and the analysis is nondestructive. The research projects using the instrumentation are quite diverse, and indication of the growing interest in this technique within the materials science community. The major users of the equipment emphasize areas related to thin films, semiconductor materials and interfacial structures. Auxiliary users utilize RBS to characterize the materials and reactions involved in corrosion and segregation processes, in semiconductor technology and in plasma fusion applications. Substantial support from the university and industrial sources will contribute to the purchase of the RBS system.

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