Multimedia Gallery
Ion implantation using a tandem accelerator
Researchers, using a new method they developed to tweak characteristics of quantum materials, infused a material with ions to control specific quantum properties. In this graphic, ions are implanted using a tandem accelerator on bulk material. Selected ion species are injected toward the terminal, and ions with specific energies are directed toward the sample.
[Research supported by U.S. National Science Foundation grants DMR 2118448, ITE 2345084 and DMR 2132647.]
Learn more in the MIT news story A new approach to fine-tuning quantum materials. (Date of image: 2024; date originally posted to NSF Multimedia Gallery: Sept. 27, 2024)
Credit: Ella Maru Studio
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